Acid Cleaning Additive
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1. Reduce residue
Efficient complexation and chelation technology effectively removes residual heavy metal ions on the surface of silicon wafers
2. Reduce HF consumption
Excellent fluorination ability, capable of cleaning silicon wafers under extremely low HF usage conditions
3. Easy to clean
Easy to clean components, optimized yield and efficiency
Efficient complexation and chelation technology effectively removes residual heavy metal ions on the surface of silicon wafers
2. Reduce HF consumption
Excellent fluorination ability, capable of cleaning silicon wafers under extremely low HF usage conditions
3. Easy to clean
Easy to clean components, optimized yield and efficiency
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